Non Topcoat Self-freezing Photoresist for Double Patterning Process
نویسندگان
چکیده
منابع مشابه
Inorganic polymer photoresist for direct ceramic patterning by photolithography.
A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2010
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.23.199